The evolution of μXRF! Combination of improved sensitivity and new imaging technology achieved high speed analysis of foreign materials in only one unit.
Simple analysis operation with no preparation required and non-destructive analysis.
Measurement points can be accessed quickly through high-precision optical observation, even in the microscopic range.
Clear and High-speed Image Mapping
- Shortened analysis time facilitates efficient measurement work.
- X-ray images with very little noise allow for even clearer observation.
Clear Optical Image Observation and Coaxial X-ray Irradiation
- Equipped with three kinds of illumination: coaxial, around and transmitted. Combining coaxial and around illuminations enables clear observation of samples with areas that are uneven, mirrored, etc.
- Coaxial, perpendicular X-ray exposure and optical image observation prevent the measurement position of samples from becoming misaligned.
Employing of imaging technology based on Raman imaging technique
Highlighting a certain element as a characteristic point simplifies detection of foreign material, obstacles, etc.
A New Solution in Foreign Material Analysis
Foreign material is detected quickly through high-speed screening and highlighting through imaging processing. Additionally, the high resolution X-ray beam enables detailed analysis of elements contained in foreign material. This series of foreign material analyses can be completed with a single unit, up to the level of several ten μm.
Analysis of Foreign Material in Films
Even difficult to visually confirm foreign materials can be detected and analyzed while checking optical observation images with high resolution of them after elemental mapping screening.
Analysis of Hydrous Samples
Enables measurement of hydrous samples and foreign materials can be detected through image processing.
|Instrument||X-ray fluorescence analytical microscope|
|Sample type||Solids, Liquids, Particles|
|Detectable elements||F － Am|
|Chamber size||450(W) x 500(D) x 80(H)||1030(W) x 950(D) x 500(H)|
|Maximum sample size||300(W) x 250(D) x 80(H)||500(W) x 500(D) x 500(H)|
|Maximum mass of sample||1 kg||10 kg|
|Optical observation||Two high resolution cameras with objective lens|
|Optical design||Vertical-Coaxial X-ray and Optical observation|
|Sample illumination/observation||Top, Bottom, Side illuminations/Bright and Dark fields|
|Voltage||Up to 50 kV|
|Current||Up to 1 mA|
|Number of probes||Up to 4|
|Primary X-ray filters for spectrum optimization||5 positions|
|X-ray Fluorescence detector||Silicon Drift Detector (SDD)|
|Mapping area||100 mm x 100 mm||350 mm x 350 mm|
|Step size||2 mm||4 mm|
|Sample environment||Full vacuum / Partial vacuum /|
|Partial vacuum / Ambient condition*|
* Detectable elements for SL version are from Na to Am
For simple analysis operation with no preparation required and non-destructive analysis
Manufactured by HORIBA Japan