The evolution of μXRF! Combination of improved sensitivity and new imaging technology achieved high speed analysis of foreign materials in only one unit.

Advanced functions

Simple analysis operation with no preparation required and non-destructive analysis.

Measurement points can be accessed quickly through high-precision optical observation, even in the microscopic range.

Clear and High-speed Image Mapping

  • Shortened analysis time facilitates efficient measurement work.
  • X-ray images with very little noise allow for even clearer observation.

Clear Optical Image Observation and Coaxial X-ray Irradiation

  • Equipped with three kinds of illumination: coaxial, around and transmitted. Combining coaxial and around illuminations enables clear observation of samples with areas that are uneven, mirrored, etc.

  • Coaxial, perpendicular X-ray exposure and optical image observation prevent the measurement position of samples from becoming misaligned.

Employing of imaging technology based on Raman imaging technique

Highlighting a certain element as a characteristic point simplifies detection of foreign material, obstacles, etc.

A New Solution in Foreign Material Analysis

Foreign material is detected quickly through high-speed screening and highlighting through imaging processing. Additionally, the high resolution X-ray beam enables detailed analysis of elements contained in foreign material. This series of foreign material analyses can be completed with a single unit, up to the level of several ten μm.


Analysis of Foreign Material in Films

Even difficult to visually confirm foreign materials can be detected and analyzed while checking optical observation images with high resolution of them after elemental mapping screening.

Analysis of Hydrous Samples

Enables measurement of hydrous samples and foreign materials can be detected through image processing.

Basic information
InstrumentX-ray fluorescence analytical microscope
Sample typeSolids, Liquids, Particles
Detectable elementsF - Am
Chamber size450(W) x 500(D) x 80(H)1030(W) x 950(D) x 500(H)
Maximum sample size300(W) x 250(D) x 80(H)500(W) x 500(D) x 500(H)
Maximum mass of sample1 kg10 kg
Optical observationTwo high resolution cameras with objective lens
Optical designVertical-Coaxial X-ray and Optical observation
Sample illumination/observationTop, Bottom, Side illuminations/Bright and Dark fields
X-ray tube
Power50 W
VoltageUp to 50 kV
CurrentUp to 1 mA
Target materialRh
X-ray optics
Number of probesUp to 4
Primary X-ray filters for spectrum optimization5 positions
X-ray Fluorescence detectorSilicon Drift Detector (SDD)
Transmission detectorNaI(Tl)
Mapping analysis
Mapping area100 mm x 100 mm350 mm x 350 mm
Step size2 mm4 mm
Operating mode
Sample environmentFull vacuum / Partial vacuum /
Ambient condition
Partial vacuum / Ambient condition*
* Detectable elements for SL version are from Na to Am




For simple analysis operation with no preparation required and non-destructive analysis

Manufactured by HORIBA Japan